Morikawa, Y. ; Sutou, T. ; Inazuki, Y. ; Adachi, T. ; Yoshida, Y. ; Kojima, K. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Dmitriev, V. ; Oshemkov, S. ; Zait, E. ; Ben-Zvi, G.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831Y-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Yoshida, Y. ; Amano, T. ; Sasaki, S. ; Itoh, K. ; Toyama, N. ; Mohri, H. ; Hayashi, N.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62833G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Noguchi, K. ; Sasaki, S. ; Yoshida, Y. ; Adachi, T. ; Abe, T. ; Mohri, H. ; Kokubo, H. ; Morikawa, Y. ; Hayashi, N.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.407-414, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Yoshida, Y. ; Sasaki, S. ; Abe, T. ; Mohri, H. ; Hayashi, N.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.759-769, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering