1.

Conference Proceedings
Conference Proceedings
1. PSM quartz etch depth evaluation with an atomic force microscope
Noguchi, K. ; Sasaki, S. ; Yoshida, Y. ; Adachi, T. ; Abe, T. ; Mohri, H. ; Kokubo, H. ; Morikawa, Y. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.407-414,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Mask CD measurements with an atomic force microscope
Yoshida, Y. ; Sasaki, S. ; Abe, T. ; Mohri, H. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.759-769,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446