1.

Conference Proceedings
Conference Proceedings
1. CD metrology of binary and phase shift masks using scatterometry [5992-55]
Lee, K. M. ; Yedur, S. ; Tabet, M. ; Tavassoli, M.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. CD-etch depth measurement from advanced phase-shift masks and wafers using optical scatterometry [6152-63]
Lee, K. M. ; Yedur, S. ; Henrichs, S. ; Tavassoli, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521P-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152