1.

Conference Proceedings
Conference Proceedings
1. A novel assist feature for contact holes to overcome problematic pitches
Yang, M. ; Lin, F. ; Yang, E. ; Yang, T. H. ; Chen, K. C. ; Ku, J. ; Lu, C. Y.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1437-1448,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Dual anti-reflection layers for ARC/hard-mask applications [6154-144]
Huang, V. ; Wu, T. S. ; Yang, M. ; Lin, F. ; Yang, E. ; Yang, T. H. ; Chen, K. C. ; Ku, J. ; Lu, C. Y.
Pub. info.: Optical Microlithography XIX.  pp.61543Q-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Multiple focal plane exposure in 248nm lithography to improve the process latitude of 110nm contact [6154-89]
Jung, S. ; Yang, E. ; Yang, T. H. ; Chen, K. C. ; Ku, J. ; Lu, c.-y.
Pub. info.: Optical Microlithography XIX.  pp.61542F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154