1.

Conference Proceedings
Conference Proceedings
1. Analytical approach to X-phenomenon in alternating phase-shifting masks
Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1209-1216,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
2.

Conference Proceedings
Conference Proceedings
2. Fogging effect consideration in mask process at 50-KeV e-beam systems
Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.786-791,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
Choi, Y.-H. ; Park, J.R. ; Sung, M.-G. ; Yang, S.-H. ; Kim, S.-H. ; Lee, H.-J. ; Lee, J.-Y. ; Jang, I.Y. ; Kim, Y.H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.819-825,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Proximity effect correction optimization considering fogging and loading effects compensation
Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.977-984,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
5.

Conference Proceedings
Conference Proceedings
5. Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system
Jang, S.-H. ; Yang, S.-H. ; Ahn, B.-S. ; Ki, W.-T. ; Choi, J.-H. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.669-674,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
6.

Conference Proceedings
Conference Proceedings
6. Analysis of mask CD error by dose modulation for fogging effect
Lee, H. ; Yang, S.-H. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.143-147,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
7.

Conference Proceedings
Conference Proceedings
7. Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect
Lee, H. ; Yang, S.-H. ; Park, J.-H. ; Moon, S.-Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.666-672,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256