1.

Conference Proceedings
Conference Proceedings
1. Block copolymers as additives: a route to enhanced resist performance
Sundararajan, N. ; Ogino, K. ; Valiyaveettil, S. ; Wang, J. ; Yang, S. ; Kameyama, A. ; Ober, C. K. ; Allen, R. D. ; Byers, J. D.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.78-85,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Surfaces of Semi-Fluorinated Block Copolymers Studied Using NEXAFS
Genzer, J. ; Sivaniah, E. ; Kramer, E. J. ; Wang, J. ; Korner, H. ; Xiang, M-L. ; Yang, S. ; Ober, C. K. ; Char, K. ; Chaudhury, M. K. ; DeKoven, B. M. ; Bubeck, R. A. ; Fischer, D. A. ; Sambasivan, S.
Pub. info.: Applications of synchrotron radiation techniques to materials science IV : sympoisum held April 13-17, 1998, San Francisco, California, U.S.A..  pp.365-,  1998.  Warrendale, Penn..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 524