1.

Conference Proceedings
Conference Proceedings
1. Evaporated resist for the fabrication and replication of LEEPL mask
Cloutier, M. ; Awad, Y. ; Lavallee, E. ; Turcotte, D. ; Beauvais, J. ; Drouin, D. ; Mun, L.K. ; Yang, P. ; Lafrance, P. ; Legario, R. ; Yoshida, A. ; Nozue, H.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.521-528,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
2.

Conference Proceedings
Conference Proceedings
2. Nanopatterning on fragile or 3D surfaces with sterol-based vapor-deposited electron beam resist
Legario, R.R. ; Kelkar, P.S. ; Beauvais, J. ; Lavallee, E. ; Drouin, D. ; Cloutier, M. ; Turcotte, D. ; Yang, P. ; Mun, L.K. ; Awad, Y. ; Lafrance, P.J.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.903-914,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376