1.

Conference Proceedings
Conference Proceedings
1. Molecular contamination control technologies for high-volume production phase in high-NA 193nm lithography
T. Nakano ; T. Tanahashi ; A. Imai ; K. Yamana ; T. Shimotsu ; N. Takahashi ; M. Shioguchi ; Y. Matsuda ; J. Kitano
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Impact of airborne NH3 and humidity against wafer-to-wafer CD variation in ArF lithography through 45-nm technology node
R. Naito ; Y. Matsuda ; M. Shioguchi ; T. Shibata
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519