Lin, 0. ; Hung, R. ; Lee, B. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Lin, J. ; Hsu, M. ; Hsu, S. D.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.835-843, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering