1.

Conference Proceedings
Conference Proceedings
1. Development of 193 nm B.A.R.C.s for dual damascene applications
Wu, H. ; Xiang, Z. ; Gonzalez, E. ; Shan, J. ; Ding, S. ; Kang, W.-B. ; Hishida, A.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1112-1118,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Optimization of organic bottom antireflective coatings' compatibility with ArF resists
Xiang, Z. ; Shan, J. ; Gonzalez, E. ; Wu, H. ; Ding, S. ; Neisser, M. ; Ho, B.-C. ; Chen, H.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1102-1111,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Design and development of high-etch-rate organic bottom antireflective coating for sub-100-nm node and beyond
Wu, H. ; Xiang, Z. ; Hishida, A. ; Abdallah, D. ; Shan, J. ; Gonzalez, E. ; Ding, S.S. ; Neisser, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.697-702,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376