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Conference Proceedings

1. Design,reticle,and wafer OPC manufacturability for the 0.18-ｦﾌm lithography generation

Lucas,K.D. ; McCallum,M. ; Falch,B.J. ; Wood,J.L. ; Kalk,F.D. ; Henderson,R.K. ; Russell,D.R.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.118-129, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

2. DUV pellicle quality assessment based on customer priorities

Wood,J.L. ; Eynon,B.G. ; Kalk,F.D.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.422-428, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

Conference Proceedings

3. Film stress and geometry effects in chrome photomask cleaning damage

Alpay,H.U. ; Wood,J.L. ; Kalk,F.D.

Pub. info.:	17th Annual BACUS Symposium on Photomask Technology and Management. pp.76-81, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3236