1.

Conference Proceedings
Conference Proceedings
1. Advances in 193-nm lithography tools
Cote,D.R. ; Ahouse,D. ; Galburt,D.N. ; Harrold,H. ; Kreuzer,J. ; Nelson,M. ; Oskotsky,M.L. ; O'Connor,G. ; Sewell,H. ; Williamson,D.M. ; Zimmerman,J.D. ; Zimmerman,R.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.542-550,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. High-numerical-aperture 193-nm exposure tool
Sewell,H. ; Cote,D.R. ; Williamson,D.M. ; Oskotsky,M.L. ; Sakin,L. ; O'Neil,T. ; Zimmerman,J.D. ; Zimmerman,R. ; Nelson,M. ; Mason,C.J. ; Ahouse,D. ; Harrold,H.G. ; Lamastra,P. ; Callan,D.
Pub. info.: Optical Microlithography XIV.  4346  pp.606-620,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346