1.

Conference Proceedings
Conference Proceedings
1. Subwavelength alignment mark signal analysis of advanced memory products
Yin,X. ; Wong,A.K. ; Wheeler,D.C. ; Williams,G. ; Lehner,E.A. ; Zach,F.X. ; Kim,B.Y. ; Fukuzaki,Y. ; Lu,Z.G. ; Credendino,S. ; Wiltshire,T.J.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.449-459,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Optimization of segmented alignment marks for advanced semidonductor fabrication processes
Wu,Q. ; Lu,Z.G. ; Williams,G. ; Zach,F.X. ; Liegl,B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.234-244,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344