1.

Conference Proceedings
Conference Proceedings
1. Full-chip level MEEF analysis using model based lithography verification [5992-95]
Kim, J. ; Wang, L. ; Zhang, D. ; Tang, Z.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922U-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Model-based full-chip verification for 65nm lithography process development [5853-42]
Kim, J. ; Wang, L. ; Zhang, D. ; Tang, Z.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.599-606,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Contact CD variation check and contact/metal overlay check using a model based full chip verification software tool [5853-41]
Wang, L. ; Kim, J. ; Zhang, D. ; Tang, Z. ; Fan, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.589-598,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853