1.

Conference Proceedings
Conference Proceedings
1. Organoelement resists for EUV lithography
Dai, J. ; Ober, C.K. ; Wang, L. ; Cerrina, F. ; Nealey, P.F.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1193-1202,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Synthesis and evaluation of novel organoelement resists for EUV lithography
Dai, J. ; Ober, C.K. ; Kim, S.-O. ; Nealey, P.F. ; Golovkina, V. ; Shin, J. ; Wang, L. ; Cerrina, F.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1164-1172,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039