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Conference Proceedings

1. Quantification of OPC performance of 150-nm gates using top-down CD-SEM

Parikh, A. ; Zhou, H. ; Wang, C.-Y. ; MacNaughton, C.W.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.500-505, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

Conference Proceedings

2. Reducing CD-SEM measurement carryover effect for 193-nm resist processes using CEq

Zhou, H. ; Wang, C.-Y. ; Zuo, A. ; Pratt, J.P.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part Two pp.742-746, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689