1.

Conference Proceedings
Conference Proceedings
1. Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography
D. Bucca ; A. Aviram ; D.E. Seeger ; W.E. Conley ; W.R. Brunsvold
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.403-412,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438
2.

Conference Proceedings
Conference Proceedings
2. New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group
J.T. Fahey ; W.E. Conley ; W.R. Brunsvold ; D.C. Yang ; W.M. Moreau
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.125-142,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438