1.

Conference Proceedings
Conference Proceedings
1. FORMATION OF BURIED α- AND β-FeSi2 IN (100) Si BY HIGH DOSE ION IMPLANTATION
Maex, K. ; Lauwers, A. ; Van Hove, M. ; Vandervorst, W. ; Van Rossum, M.
Pub. info.: Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.869-874,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 279
2.

Conference Proceedings
Conference Proceedings
2. THE FORMATION AND REMOVAL OF RESIDUE FORMED DURING TiN FLUOROCARBON PLASMA ETCHING
Kim, Y.B. ; Conard, T. ; Vanhaeren, D. ; Baklanov, M. ; Vanhaelemeersch, S. ; Vandervorst, W. ; Maex, K.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.610-616,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
3.

Conference Proceedings
Conference Proceedings
3. 29 Influence of Activation Annealing and Silicidation Process on as Redistribution and Pile-up at the NixSiy/SiO2 Interface
Pawlak, M. ; Kittl, J. A. ; Janssens, T. ; Lauwers, A. ; Vandervorst, W. ; Anil, K. G. ; Schram, T. ; Veloso, A. ; van Dal, M.J. H. ; Maex, K. ; Vantomme, A.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.241-248,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
4.

Conference Proceedings
Conference Proceedings
4. The Role of Preamorphization and Activation for Ultra Shallow Junction Formation on Strained Si Layers Grown on SiGe Buffer
Pawlak, B.J. ; Vandervorst, W. ; Lindsay, R. ; Wolf, I.De ; Roozeboom, F. ; Delhougne, R. ; Benedetti, A. ; Loo, R. ; Caymax, M. ; Maex, K. ; Cowern, N.E.B.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.281-286,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
5.

Conference Proceedings
Conference Proceedings
5. The Role of Preamorphization and Activation for Ultra-Shallow Junction Formation on Strained Si Layers Grown on SiGe Buffer
Pawlak, B.J. ; Vandervorst, W. ; Lindsay, R. ; Wolf, I.De ; Roozeboom, F. ; Delhougne, R. ; Benedetti, A. ; Loo, R. ; Caymax, M. ; Maex, K. ; Cowern, N.E.B.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.423-430,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
6.

Conference Proceedings
Conference Proceedings
6. ION IMPLANTATION OF HIGH DOSES OF Co IN Si1-xGex ALLOYS
Lauwers, A. ; Maex, K. ; Vandervorst, W. ; Brijs, G. ; Poortmans, J. ; Caymax, M. ; Vanhellemont, J. ; Petersson, S.
Pub. info.: Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A..  pp.299-304,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 235
7.

Conference Proceedings
Conference Proceedings
7. A Comparison Of Spike, Flash, SPER and Laser Annealing For 45nm CMOS
Lindsay, R. ; Pawlak, B. ; Kittl, J. ; Henson, K. ; Torregiani, C. ; Giangrandi, S. ; Surdeanu, R. ; Vandervorst, W. ; Mayur, A. ; Ross, J. ; McCoy, S. ; Gelpey, J. ; Elliott, K. ; Pages, X. ; Satta, A. ; Lauwers, A. ; Stolk, P. ; Maex, K.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.261-266,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
8.

Conference Proceedings
Conference Proceedings
8. Epitaxial CoSi2 Formation by a Cr or Mo Interlayer
Detavernier, Christophe ; Van Meirhaeghe, Roland L. ; Cardon, Felix ; Maex, K. ; Brijs, B. ; Vandervorst, W.
Pub. info.: Gate stack and silicide issues in silicon processing : symposium held April 25-27, 2000, San Francisco, California, U.S.A..  pp.C10.2-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 611