1.

Conference Proceedings
Conference Proceedings
1. Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65]
Van Look, L. ; Kasprowicz, B. ; Zibold, A. ; Degel, W. ; Vandenberghe, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921S-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]
Hendrickx, E. ; Op de Beeck, M. ; Gronheid, R. ; Versluijs, J. ; Van Look, L. ; Ercken, M. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XIX.  pp.61541X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Optical extensions towards the 45-nm node
Hendrickx, E. ; Monnoyer, P. ; Van Look, L. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVII.  pp.357-368,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377