1.

Conference Proceedings
Conference Proceedings
1. ArF solutions for low-k1 back-end imaging
Wiaux, V. ; Montgomery, P.K. ; Vandenberghe, G. ; Monnoyer, P. ; Ronse, K.G. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Finders, J. ; Socha, R. ; Broeke, D.J.V.D.
Pub. info.: Optical Microlithography XVI.  Part One  pp.270-281,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
Park, J. ; Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Dusa, M. ; Socha, R. ; Finders, J. ; Vleeming, B. ; van Oosten, A. ; Nikolsky, P. ; Wiaux, V. ; Hendrickx, E. ; Bekaert, J. ; Vandenberghe, G.
Pub. info.: Photomask Technology 2006.  pp.634922-634922,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. Mask topography effect in chromeless phase lithography
Philipsen, V. ; Bekaert, J. ; Vandenberghe, G. ; Jonckheere, R. ; Van Den Broeke, D. ; Socha, R.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.669-679,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567