Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering