Wiaux, V. ; Bekaert, J. ; Chen, J.F. ; Hsu, S.D. ; Ronse, K.G. ; Socha, R.J. ; Vandenberghe, G. ; Van Den Broeke, D.J.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.585-594, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering