1.

Conference Proceedings
Conference Proceedings
1. Oxide Mediated Epitaxial Growth of CoSi2 in a Single Deposition Step
Ohmi, S. ; Tung, R. T.
Pub. info.: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.117-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 564
2.

Conference Proceedings
Conference Proceedings
2. Facilitated C54-TiSi2 Formation With Elevated Deposition Temperature: A Study of Co-Deposited Layers
Ohmi, S. ; Tung, R. T.
Pub. info.: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.47-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 564
3.

Conference Proceedings
Conference Proceedings
3. Improved Thermal Stability of Ultrathin CoSi2 Layers by Oxygen Annealing
Tung, R. T. ; Ohmi, S.
Pub. info.: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.157-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 514
4.

Conference Proceedings
Conference Proceedings
4. Oxide Mediated Epitaxy on Planar and Non-Planar Si
Tung, R. T. ; Howard, D. J. ; Ohmi, S. ; Caymax, M. ; Maex, K.
Pub. info.: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.427-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 514