1.

Conference Proceedings
Conference Proceedings
1. Reducing or eliminating line-end shortening and iso/dense bias by tuning NA and sigma
Toublan,O. ; Schiavone,P.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.912-920,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Flare impact on the intrafield CD control for sub-0.25-ｦﾌm patterning
Luce,E. ; Minghetti,B. ; Schiavone,P. ; Toublan,O. ; Weill,A.P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.368-381,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Phase aware proximity correction for advanced masks
Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B. ; Do,T. ; Donnelly,T. ; Granik,Y. ; Schellenberg,F.M. ; Schiavone,P.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.160-170,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. OPC beyond 0.18 ｦﾌm:OPC on PSM gates
Schellenberg,F.M. ; Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y. ; Hughes,G.P. ; MacDonald,S.S. ; West,C.A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1062-1069,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings
Conference Proceedings
5. New approach to PEB mechanisms in novolac-DNQ resists:influence of physical and viscoelastic properties
Toublan,O. ; Peloso,H. ; Prola,A. ; Paniez,P.J.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.345-354,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
6.

Conference Proceedings
Conference Proceedings
6. Application of a new approach to optical proximity correction
Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.639-647,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
7.

Conference Proceedings
Conference Proceedings
7. Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections
Capodieci,L. ; Torres,J.A. ; Socha,R.J. ; Hollerbach,U. ; Chen,J.F. ; Os,C.van ; Granik,Yu. ; Toublan,O. ; Cobb,N.B.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.58-67,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
8.

Conference Proceedings
Conference Proceedings
8. New process monitor for reticles and wafers:the MEEF meter
Schellenberg,F.M. ; LaCour,P. ; Toublan,O. ; Anderson,G. ; Yip,R.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.187-194,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
9.

Conference Proceedings
Conference Proceedings
9. Fully automatic side lobe detection and correction technique for attenuated phase-shift masks
Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y.
Pub. info.: Optical Microlithography XIV.  4346  pp.1541-1547,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
10.

Conference Proceedings
Conference Proceedings
10. Phase and transmission errors aware OPC solution for PSM: feasability demonstration
Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.862-868,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
11.

Conference Proceedings
Conference Proceedings
11. Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation
Granik,Yu. ; Cobb,N.B. ; Sahouria,E.Y. ; Toublan,O. ; Capodieci,L. ; Socha,R.J.
Pub. info.: Process Control and Diagnostics.  pp.335-341,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4182
12.

Conference Proceedings
Conference Proceedings
12. (Sub-) 100-nm gate patterning using 248-nm alternating PSM
Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.61-69,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
13.

Conference Proceedings
Conference Proceedings
13. Leap ahead in mask data processing for technology nodes below 130nm
Miramond,C. ; Goubier,D. ; Chomat,M. ; Trouiller,Y. ; Rody,Y.F. ; Toublan,O.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.721-726,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
14.

Conference Proceedings
Conference Proceedings
14. Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation
Barberet,A. ; Fanget,G.L. ; Buck,P.D. ; Toublan,O. ; Richoilley,J.-C. ; Tissier,M.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.511-521,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
15.

Conference Proceedings
Conference Proceedings
15. New approach to optical proximity correction
Rosenbusch,A. ; Juffermans,A.H. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Watson,J.C. ; Ziegler,W. ; Zimmermann,R.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.585-593,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546