1.

Conference Proceedings
Conference Proceedings
1. Phase aware proximity correction for advanced masks
Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B. ; Do,T. ; Donnelly,T. ; Granik,Y. ; Schellenberg,F.M. ; Schiavone,P.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.160-170,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. OPC beyond 0.18 ｦﾌm:OPC on PSM gates
Schellenberg,F.M. ; Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y. ; Hughes,G.P. ; MacDonald,S.S. ; West,C.A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1062-1069,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. New process monitor for reticles and wafers:the MEEF meter
Schellenberg,F.M. ; LaCour,P. ; Toublan,O. ; Anderson,G. ; Yip,R.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.187-194,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998