1.

Conference Proceedings
Conference Proceedings
1. Application of a new approach to optical proximity correction
Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.639-647,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. (Sub-) 100-nm gate patterning using 248-nm alternating PSM
Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.61-69,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. New approach to optical proximity correction
Rosenbusch,A. ; Juffermans,A.H. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Watson,J.C. ; Ziegler,W. ; Zimmermann,R.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.585-593,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546