1.

Conference Proceedings
Conference Proceedings
1. Phase aware proximity correction for advanced masks
Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B. ; Do,T. ; Donnelly,T. ; Granik,Y. ; Schellenberg,F.M. ; Schiavone,P.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.160-170,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. OPC beyond 0.18 ｦﾌm:OPC on PSM gates
Schellenberg,F.M. ; Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y. ; Hughes,G.P. ; MacDonald,S.S. ; West,C.A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1062-1069,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections
Capodieci,L. ; Torres,J.A. ; Socha,R.J. ; Hollerbach,U. ; Chen,J.F. ; Os,C.van ; Granik,Yu. ; Toublan,O. ; Cobb,N.B.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.58-67,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
4.

Conference Proceedings
Conference Proceedings
4. Fully automatic side lobe detection and correction technique for attenuated phase-shift masks
Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y.
Pub. info.: Optical Microlithography XIV.  4346  pp.1541-1547,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. Phase and transmission errors aware OPC solution for PSM: feasability demonstration
Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.862-868,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation
Granik,Yu. ; Cobb,N.B. ; Sahouria,E.Y. ; Toublan,O. ; Capodieci,L. ; Socha,R.J.
Pub. info.: Process Control and Diagnostics.  pp.335-341,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4182