Sekine, A. ; Nagahama, H. ; Tojo, T. ; Akeno, K. ; Hirano, R.
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Optomechatronic systems III : 12-14 November 2002, Stuttgart, Germany. pp.624-631, 2002. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Yamanaka, K. ; Okuda, T. ; Tojo, T. ; Ijima, S. ; Onozawa, K. ; Ueda, D. ; Kubo, J. ; Kitagawa, S.
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Advanced optical and quantum memories and computing : 27-28 January 2004, San Jose, California, USA. pp.90-98, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Fujiwara, H. ; Kimoto, T. ; Tojo, T. ; Matsunami, H.
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Silicon carbide and related materials 2004 : ECSCRM 2004 : proceedings of the 5th European Conference on Silicon Carbide and Related Materials, August 31 - September 4 2004, Bologna, Italy. pp.151-154, 2005. Uetikon-Zuerich. Trans Tech Publications
Fujiwara, H. ; Danno, K. ; Kimoto, T. ; Tojo, T. ; Matsunami, H.
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Silicon carbide and related materials 2003 : ICSCRM, 2003 : proceedings of the 10th International Conference on Silicon Carbide and Related Materials 2003, Lyon, France, October 5-10, 2003. pp.205-208, 2004. Uetikon-Zuerich. Trans Tech Publications
Takahashi, T. ; Saito, S. ; Okumura, T. ; Suzuki, E. ; Kojima, T. ; Motomiya, S. ; Maruyama, H. ; Suzuki, H. ; Machida, K. ; Tojo, T.
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Metrology, Inspection, and Process Control for Microlithography XX. pp.61523P-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Tojo, T. ; Yoshikawa, R. ; Ogawa, Y. ; Tamamushi, S. ; Hattori, Y. ; Koikari, S. ; Kusakabe, H. ; Abe, T. ; Ogasawara, M. ; Akeno, K. ; Anze, H. ; Hattori, K. ; Hirano, R. ; Yoshitake, S. ; Iijima, T. ; Ohtoshi, K. ; Matsuki, K. ; Shimomura, N. ; Yamada, N. ; Higurashi, H. ; Nakayamada, N. ; Fukudome, Y. ; Hara, S. ; Murakami, E. ; Kamikubo, T. ; Suzuki, Y. ; Oogi, S. ; Shimizu, M. ; Nishimura, S. ; Tsurumaki, H. ; Yasuda, S. ; Ooki, K. ; Koyama, K. ; Watanabe, S. ; Yano, M. ; Suzuki, H. ; Hoshino, H. ; Toriumi, M. ; Watanabe, O. ; Tsuji, K. ; Katayama, M. ; Tsuchiya, S. ; Suzuki, K. ; Kurasawa, S. ; Okuzono, K. ; Yamada, H. ; Handa, K. ; Suzuki, Y. ; Akiyama, T. ; Tada, Y. ; Noma, A. ; Takigawa, T.
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Photomask and X-Ray Mask Technology VI. pp.416-425, 1999. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Chung, D.-H.P. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
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Photomask and Next-Generation Lithography Mask Technology XI. pp.320-329, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Tojo, T. ; Hirano, R. ; Tsuchiya, H. ; Oaki, J. ; Nishizaka, T. ; Sanada, Y. ; Matsuki, K. ; Isomura, I. ; Ogawa, R. ; Kobayashi, N. ; Nakashima, K. ; Sugihara, S. ; Inoue, H. ; Imai, S. ; Suzuki, H. ; Sekine, A. ; Taya, M. ; Miwa, A. ; Yoshioka, N. ; Ohira, K. ; Chung, D. -H. ; Otaki, M.
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24th Annual BACUS Symposium on Photomask Technology. pp.1011-1023, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering