1.

Conference Proceedings
Conference Proceedings
1. Lens-cementing technology used in optical system of DUV wavelength region: selection of optical cement and degradation evaluation by DUV irradiation [6152-149]
Takahashi, T. ; Saito, S. ; Okumura, T. ; Suzuki, E. ; Kojima, T. ; Motomiya, S. ; Maruyama, H. ; Suzuki, H. ; Machida, K. ; Tojo, T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61523P-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
2.

Conference Proceedings
Conference Proceedings
2. Advanced electron-beam writing system EX-11 for next-generation mask fabrication
Tojo, T. ; Yoshikawa, R. ; Ogawa, Y. ; Tamamushi, S. ; Hattori, Y. ; Koikari, S. ; Kusakabe, H. ; Abe, T. ; Ogasawara, M. ; Akeno, K. ; Anze, H. ; Hattori, K. ; Hirano, R. ; Yoshitake, S. ; Iijima, T. ; Ohtoshi, K. ; Matsuki, K. ; Shimomura, N. ; Yamada, N. ; Higurashi, H. ; Nakayamada, N. ; Fukudome, Y. ; Hara, S. ; Murakami, E. ; Kamikubo, T. ; Suzuki, Y. ; Oogi, S. ; Shimizu, M. ; Nishimura, S. ; Tsurumaki, H. ; Yasuda, S. ; Ooki, K. ; Koyama, K. ; Watanabe, S. ; Yano, M. ; Suzuki, H. ; Hoshino, H. ; Toriumi, M. ; Watanabe, O. ; Tsuji, K. ; Katayama, M. ; Tsuchiya, S. ; Suzuki, K. ; Kurasawa, S. ; Okuzono, K. ; Yamada, H. ; Handa, K. ; Suzuki, Y. ; Akiyama, T. ; Tada, Y. ; Noma, A. ; Takigawa, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.416-425,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
3.

Conference Proceedings
Conference Proceedings
3. Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
Tojo, T. ; Hirano, R. ; Tsuchiya, H. ; Oaki, J. ; Nishizaka, T. ; Sanada, Y. ; Matsuki, K. ; Isomura, I. ; Ogawa, R. ; Kobayashi, N. ; Nakashima, K. ; Sugihara, S. ; Inoue, H. ; Imai, S. ; Suzuki, H. ; Sekine, A. ; Taya, M. ; Miwa, A. ; Yoshioka, N. ; Ohira, K. ; Chung, D. -H. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1011-1023,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567