1.

Conference Proceedings
Conference Proceedings
1. Optical mask inspection strategy for 65-nm node and beyond
Chung, D.-H.P. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.320-329,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era
Chung, D. -H. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.993-1004,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
3.

Conference Proceedings
Conference Proceedings
3. Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
Tojo, T. ; Hirano, R. ; Tsuchiya, H. ; Oaki, J. ; Nishizaka, T. ; Sanada, Y. ; Matsuki, K. ; Isomura, I. ; Ogawa, R. ; Kobayashi, N. ; Nakashima, K. ; Sugihara, S. ; Inoue, H. ; Imai, S. ; Suzuki, H. ; Sekine, A. ; Taya, M. ; Miwa, A. ; Yoshioka, N. ; Ohira, K. ; Chung, D. -H. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1011-1023,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567