1.

Conference Proceedings
Conference Proceedings
1. Characterizing post-exposure bake processing for transient- and stedy-state conditions in the context of critical dimension control
Steele, D.A. ; Coniglio, A. ; Tang, C. ; Singh, B. ; Nip, S. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.517-530,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
2.

Conference Proceedings
Conference Proceedings
2. Across-wafer CD uniformity enhancement through control of multizone PEB profiles
Zhang, Q. ; Friedberg, P.D. ; Tang, C. ; Singh, B. ; Poolla, K. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.276-286,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
3.

Conference Proceedings
Conference Proceedings
3. Time-based PEB adjustment for optimizing CD distributions
Friedberg, P.D. ; Tang, C. ; Singh, B. ; Brueckner, T. ; Gruendke, W. ; Schulz, B. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.703-712,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375