1.

Conference Proceedings
Conference Proceedings
1. Across-wafer CD uniformity enhancement through control of multizone PEB profiles
Zhang, Q. ; Friedberg, P.D. ; Tang, C. ; Singh, B. ; Poolla, K. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.276-286,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
2.

Conference Proceedings
Conference Proceedings
2. Time-based PEB adjustment for optimizing CD distributions
Friedberg, P.D. ; Tang, C. ; Singh, B. ; Brueckner, T. ; Gruendke, W. ; Schulz, B. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.703-712,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375