1.

Conference Proceedings
Conference Proceedings
1. Detection and repair of multiphase defects on alternating phase-shift masks for DUV Lithography
Nagashige,S. ; Hayashi,K. ; Akima,S. ; Takahashi,H. ; Chiba,K. ; Yamada,Y. ; Matsuzawa,Y.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.127-137,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Optimization of ArF alternating phase-shifting mask structure for 100-nm node and inspection of phase defects
Chiba,K. ; Takahashi,H. ; Nozaki,W. ; Akima,S. ; Nagashige,S. ; Yamada,Y.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.430-440,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562