Hasegawa, M. ; Ouchi, C. ; Hasegawa, T. ; Kato, S. ; Ohkubo, A. ; Suzuki, A. ; Sugisaki, K. ; Okada, M. ; Otaki, K. ; Murakami, K. ; Saito, J. ; Niibe, M. ; Takeda, M.
Pub. info.:
Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA. pp.27-36, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering