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Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA. pp.27-36, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Murakami, K. ; Saito, J. ; Ota, K. ; Kondo, H. ; Ishii, M. ; Kawakami, J. ; Oshino, T. ; Sugisaki, K. ; Zhu, Y. ; Hasegawa, M. ; Sekine, Y. ; Takeuchi, S. ; Ouchi, C. ; Kakuchi, O. ; Watanabe, Y. ; Hasegawa, T. ; Hara, S. ; Suzuki, A.
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Emerging Lithographic Technologies VII. 1 pp.257-264, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering