1.

Conference Proceedings
Conference Proceedings
1. Recent progress of EUV wavefront metrology in EUVA
Hasegawa, M. ; Ouchi, C. ; Hasegawa, T. ; Kato, S. ; Ohkubo, A. ; Suzuki, A. ; Sugisaki, K. ; Okada, M. ; Otaki, K. ; Murakami, K. ; Saito, J. ; Niibe, M. ; Takeda, M.
Pub. info.: Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA.  pp.27-36,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5533
2.

Conference Proceedings
Conference Proceedings
2. New approach for realizing k1=0.3 optical lithography
Hasegawa, M. ; Suzuki, A. ; Saito, K. ; Yoshii, M.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.278-289,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
3.

Conference Proceedings
Conference Proceedings
3. Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes
Murakami, K. ; Saito, J. ; Ota, K. ; Kondo, H. ; Ishii, M. ; Kawakami, J. ; Oshino, T. ; Sugisaki, K. ; Zhu, Y. ; Hasegawa, M. ; Sekine, Y. ; Takeuchi, S. ; Ouchi, C. ; Kakuchi, O. ; Watanabe, Y. ; Hasegawa, T. ; Hara, S. ; Suzuki, A.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.257-264,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
4.

Conference Proceedings
Conference Proceedings
4. Challenging the limit of single mask exposure
Yamazoe, K. ; Hasegawa, M. ; Saitoh, K. ; Suzuki, A.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1601-1612,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. New resolution enhancement method realizing the limit of single mask exposure
Yamazoe, K. ; Hasegawa, M. ; Saitoh, K. ; Suzuki, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.471-482,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
6.

Conference Proceedings
Conference Proceedings
6. EUV wavefront metrology system in EUVA
Hasegawa, T. ; Ouchi, C. ; Hasegawa, M. ; Kato, S. ; Suzuki, A. ; Sugisaki, K. ; Murakami, K. ; Saito, J. ; Niibe, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.797-807,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
7.

Conference Proceedings
Conference Proceedings
7. Lateral shearing interferometer for EUVL: theoretical analysis and experiment
Zhu, Y. ; Sugisaki, K. ; Ouchi, C. ; Hasegawa, M. ; Niibe, M. ; Suzuki, A. ; Murakami, K.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.824-832,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
8.

Conference Proceedings
Conference Proceedings
8. Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI
Sugisaki, K. ; Hasegawa, M. ; Kato, S. ; Ouchi, C. ; Saito, J. ; Niibe, M. ; Suzuki, A. ; Murakami, K.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.702-709,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374