1.

Conference Proceedings
Conference Proceedings
1. CLEANING OF SiO2 BULK LAYERS WITH SUCCESSIVE PROCESSING OF POLY-Si CVD AND UV/Cl2
Sugino, R. ; Tada, Y. ; Ito, T. ; Okui, Y. ; Sakuma, J.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.328-335,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
2.

Conference Proceedings
Conference Proceedings
2. Fe REMOVAL EFFECTS OF SILICON CHLORIDES (SiCl R) DURING UV/Cl2 DRY CLEANING
Sugino, R. ; Okui, Y. ; Shigeno, M. ; Ohkubo, S. ; Takasaki, K. ; Ito, T.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.291-298,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35