1.

Conference Proceedings
Conference Proceedings
1. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.107-117,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Study of characteristics and control of haze contamination induced by photochemical reaction
Han, S.-J. ; Yu, S.-Y. ; Sung, M.-G. ; Kim, Y.-H. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.563-567,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130