1.

Conference Proceedings
Conference Proceedings
1. Fast topography simulation using differential method
Zinn, S.Y. ; Kim, S.-H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.92-100,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF
Kang, M.-A. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1115-1124,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Analytical approach to X-phenomenon in alternating phase-shifting masks
Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1209-1216,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
Choi, Y.-H. ; Park, J.R. ; Sung, M.-G. ; Yang, S.-H. ; Kim, S.-H. ; Lee, H.-J. ; Lee, J.-Y. ; Jang, I.Y. ; Kim, Y.H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.819-825,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Application of Cr-less mask technology for sub-100-nm gate with single exposure
Kim, S.-H. ; Chung, D.-H. ; Park, J.S.. ; Shin, I.K. ; Choi, S.W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.568-578,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography
Park, J.-S. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Laidig, T.L. ; Van den Broeke, D.J. ; Chen, J.F.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.112-121,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256