1.

Conference Proceedings
Conference Proceedings
1. Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-ｦﾌm reticle fabrication
Arai,T. ; Sakamizu,T. ; Kasuya,K. ; Katoh,K. ; Soga,T. ; Saitoh,H. ; Shiraishi,H. ; Hoga,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.281-288,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
2.

Conference Proceedings
Conference Proceedings
2. Chemical-amplification posotive-resist design for 0.18-ｦﾌm reticle fabricaton using the 50-kV HL-800M electron-beam system
Arai,T. ; Sakamizu,Y. ; Soga,T. ; Satoh,H. ; Katoh,K. ; Shiraishi,H. ; Hoga,M.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.190-195,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412