1.

Conference Proceedings
Conference Proceedings
1. Performance improvement in e-beam reticle writer HL-8OOM
Satoh,H. ; Someda,Y. ; Saitou,N. ; Kawasaki,K. ; Mizuno,K. ; Kadowaki,Y. ; Hoga,M. ; Soga,T.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.72-83,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Development methods for chemical amplification resist
Saitoh,H. ; Soga,T. ; Kubo,S. ; Sanki,S. ; Hoga,M.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.269-278,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
3.

Conference Proceedings
Conference Proceedings
3. Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-ｦﾌm reticle fabrication
Arai,T. ; Sakamizu,T. ; Kasuya,K. ; Katoh,K. ; Soga,T. ; Saitoh,H. ; Shiraishi,H. ; Hoga,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.281-288,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
4.

Conference Proceedings
Conference Proceedings
4. Chemical-amplification posotive-resist design for 0.18-ｦﾌm reticle fabricaton using the 50-kV HL-800M electron-beam system
Arai,T. ; Sakamizu,Y. ; Soga,T. ; Satoh,H. ; Katoh,K. ; Shiraishi,H. ; Hoga,M.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.190-195,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412