1.

Conference Proceedings
Conference Proceedings
1. 0.11-μm imaging in KrF lithography using dipole illumination
Eurlings,M. ; Setten,E.van ; Torres,J.A. ; Dusa,M.V. ; Socha,R.J. ; Capodieci,L. ; Finders,J.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.266-278,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
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Conference Proceedings
Conference Proceedings
2. CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques
Vandenberghe,G. ; Marschner,T. ; Ronse,K. ; Socha,R.J. ; Dusa,M.V.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.228-238,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. KrF lithography for 130 nm
Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.192-205,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
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Conference Proceedings
Conference Proceedings
4. Modeling oblique incidence effects in photomasks
Pistor,T.V. ; Neureuther,A.R. ; Socha,R.J.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.228-237,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
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Conference Proceedings
Conference Proceedings
5. CD error sensitivity to "sub-killer" defects at k1 near 0.4:II
Nakagawa,K.H. ; Chen,J.F. ; Socha,R.J. ; Dusa,M.V. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Broeke,D.J.van den
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.893-904,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
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Conference Proceedings
Conference Proceedings
6. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.73-89,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
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Conference Proceedings
Conference Proceedings
7. Dual damascene photo process using negative-tone resist
Shi,X. ; Fung,A.C. ; Hsu,S. ; Li,Z. ; Nguyen,T. ; Socha,R.J. ; Conley,W.E. ; Dusa,M.V.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.835-842,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
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Conference Proceedings
Conference Proceedings
8. Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections
Capodieci,L. ; Torres,J.A. ; Socha,R.J. ; Hollerbach,U. ; Chen,J.F. ; Os,C.van ; Granik,Yu. ; Toublan,O. ; Cobb,N.B.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.58-67,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
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Conference Proceedings
Conference Proceedings
9. Forbidden pitches for 130-nm lithography and below
Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1140-1155,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
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Conference Proceedings
Conference Proceedings
10. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.38-54,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
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Conference Proceedings
Conference Proceedings
11. Understanding the impact of full-field mask error factor
Conley,W.E. ; Shi,X. ; Hankinson,M. ; Dusa,M.V. ; Socha,R.J. ; Garza,C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.580-587,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
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Conference Proceedings
Conference Proceedings
12. Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks
Reilly,M.T. ; Parker,C. ; Kvam,K. ; Socha,R.J. ; Dusa,M.V.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1209-1222,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
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Conference Proceedings
Conference Proceedings
13. Design and analysis of across-chip linewidth variation for printed features at 130 nm and below
Chen,J.F. ; Socha,R.J. ; Puntambekar,K. ; Wampler,K.E. ; Caldwell,R.F. ; Dusa,M.V. ; Love,J.C. ; Yeric,G. ; Stoner,B.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.168-177,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
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Conference Proceedings
Conference Proceedings
14. Simulating photomask edge roughness and corner rounding
Adam,K. ; Socha,R.J. ; Pistor,T. ; Neureuther,A.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.215-223,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
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Conference Proceedings
Conference Proceedings
15. The MEEF shall inherit the Earth
Conley,W. ; Garza,C.M. ; Dusa,M.V. ; Socha,R.J. ; Bendik,J.J. ; Mack,C.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.251-258,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
16.

Conference Proceedings
Conference Proceedings
16. Can DUV take us below 100 nm?
Finders,J. ; Jorritsma,L. ; Eurlings,M. ; Moerman,R. ; Greevenbroek,H.van ; Schoot,J.B.van ; Flagello,D.G. ; Socha,R.J. ; Stammler,T.
Pub. info.: Optical Microlithography XIV.  4346  pp.153-165,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
17.

Conference Proceedings
Conference Proceedings
17. Binary halftone chromeless PSM technology for λ/4 optical lithography
Chen,J.F. ; Petersen,J.S. ; Socha,R.J. ; Laidig,T.L. ; Wampler,K.E. ; Nakagawa,K.H. ; Hughes,G.P. ; MacDonald,S.S. ; Ng,W.
Pub. info.: Optical Microlithography XIV.  4346  pp.515-533,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
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Conference Proceedings
Conference Proceedings
18. Trench warfare!: fitting photons for fine-feature fabrication
Kuijten,J.P. ; Conley,W. ; Socha,R.J. ; Goor,S.van de ; Hsu,S. ; Smith,D. ; Oliveras,M. ; Strozenski,K.
Pub. info.: Optical Microlithography XIV.  4346  pp.1058-1065,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
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Conference Proceedings
Conference Proceedings
19. Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation
Granik,Yu. ; Cobb,N.B. ; Sahouria,E.Y. ; Toublan,O. ; Capodieci,L. ; Socha,R.J.
Pub. info.: Process Control and Diagnostics.  pp.335-341,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4182
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Conference Proceedings
Conference Proceedings
20. Effect of the partial coherence on reflective notching
Socha,R.J. ; Progler,C.J. ; Neureuther,A.R.
Pub. info.: Optical Microlithography X.  pp.479-490,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
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Conference Proceedings
Conference Proceedings
21. Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
Petersen,J.S. ; Socha,R.J. ; Naderi,A.R. ; Baker,C.A. ; Rizvi,S.A. ; BanDenBroeke,D. ; Kachwala,N. ; Chen,F. ; Laiding,S. ; Wampler,K.E. ; Caldwell,R.F. ; Takeuchi,S. ; Yamada,Y. ; Senoh,T. ; McCallum,M.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.503-520,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
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Conference Proceedings
Conference Proceedings
22. Impact of attenuated PSM repair for 130-nm polygate lithography process
Shi,X. ; Hsu,S. ; Socha,R.J. ; Chen,J.F. ; Cheng,A. ; Su,C. ; Cheng,J. ; Chen,A. ; Lin,H. ; Wang,D. ; Chen,D. ; Lin,A. ; Conley,W. ; Metzger,D. ; Shi,X. ; Imamura,P.H. ; Sherrill,M.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.707-715,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
23.

Conference Proceedings
Conference Proceedings
23. Understanding the forbidden pitch and assist feature placement
Shi,X. ; Hsu,S. ; Chen,F. ; Hsu,M. ; Socha,R.J. ; Dusa,M.V.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.968-979,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
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Conference Proceedings
Conference Proceedings
24. Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
Hsu,S. ; Shi,X. ; Socha,R.J. ; Chen,J.F. ; Yee,J.C. ; Anath,M. ; Desai,S. ; Imamura,P.H. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Hsu,S. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.783-796,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
25.

Conference Proceedings
Conference Proceedings
25. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I
Socha,R.J. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.617-641,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
26.

Conference Proceedings
Conference Proceedings
26. Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering-bar optical proximity correction
Adam,K. ; Socha,R.J. ; Dusa,M.V. ; Neureuther,A.R.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.642-650,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
27.

Conference Proceedings
Conference Proceedings
27. Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.288-303,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546