1.

Conference Proceedings
Conference Proceedings
1. Dual damascene photo process using negative-tone resist
Shi,X. ; Fung,A.C. ; Hsu,S. ; Li,Z. ; Nguyen,T. ; Socha,R.J. ; Conley,W.E. ; Dusa,M.V.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.835-842,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.38-54,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Understanding the impact of full-field mask error factor
Conley,W.E. ; Shi,X. ; Hankinson,M. ; Dusa,M.V. ; Socha,R.J. ; Garza,C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.580-587,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Impact of attenuated PSM repair for 130-nm polygate lithography process
Shi,X. ; Hsu,S. ; Socha,R.J. ; Chen,J.F. ; Cheng,A. ; Su,C. ; Cheng,J. ; Chen,A. ; Lin,H. ; Wang,D. ; Chen,D. ; Lin,A. ; Conley,W. ; Metzger,D. ; Shi,X. ; Imamura,P.H. ; Sherrill,M.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.707-715,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
5.

Conference Proceedings
Conference Proceedings
5. Understanding the forbidden pitch and assist feature placement
Shi,X. ; Hsu,S. ; Chen,F. ; Hsu,M. ; Socha,R.J. ; Dusa,M.V.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.968-979,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
6.

Conference Proceedings
Conference Proceedings
6. Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
Hsu,S. ; Shi,X. ; Socha,R.J. ; Chen,J.F. ; Yee,J.C. ; Anath,M. ; Desai,S. ; Imamura,P.H. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Hsu,S. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.783-796,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344