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13 results

Conference Proceedings

1. 0.11-μm imaging in KrF lithography using dipole illumination

Eurlings,M. ; Setten,E.van ; Torres,J.A. ; Dusa,M.V. ; Socha,R.J. ; Capodieci,L. ; Finders,J.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.266-278, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques

Vandenberghe,G. ; Marschner,T. ; Ronse,K. ; Socha,R.J. ; Dusa,M.V.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.228-238, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. KrF lithography for 130 nm

Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.192-205, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. CD error sensitivity to "sub-killer" defects at k1 near 0.4:II

Nakagawa,K.H. ; Chen,J.F. ; Socha,R.J. ; Dusa,M.V. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Broeke,D.J.van den

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.893-904, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

5. Dual damascene photo process using negative-tone resist

Shi,X. ; Fung,A.C. ; Hsu,S. ; Li,Z. ; Nguyen,T. ; Socha,R.J. ; Conley,W.E. ; Dusa,M.V.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.835-842, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

6. Forbidden pitches for 130-nm lithography and below

Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1140-1155, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results

Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.38-54, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

8. Understanding the impact of full-field mask error factor

Conley,W.E. ; Shi,X. ; Hankinson,M. ; Dusa,M.V. ; Socha,R.J. ; Garza,C.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.580-587, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

9. Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks

Reilly,M.T. ; Parker,C. ; Kvam,K. ; Socha,R.J. ; Dusa,M.V.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1209-1222, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

10.

Conference Proceedings

10. Design and analysis of across-chip linewidth variation for printed features at 130 nm and below

Chen,J.F. ; Socha,R.J. ; Puntambekar,K. ; Wampler,K.E. ; Caldwell,R.F. ; Dusa,M.V. ; Love,J.C. ; Yeric,G. ; Stoner,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.168-177, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

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