1.

Conference Proceedings
Conference Proceedings
1. 0.33-k1 ArF lithography for 100-nm DRAM
Bok, C.K. ; Kim, S.-K. ; Kim, H.-B. ; Oh, J.-S. ; Ahn, C.-N. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.810-821,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Optical lithography simulation considering impact of mask errors
Kim, H.-B. ; Ma, W.-K. ; Ahn, C.-N. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1278-1286,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Intrafield CD variation by stray light from neighboring field
Lim, C.-M. ; Song, J.-H. ; Woo, S.-S. ; Kwon, K.-S. ; Ahn, C.-N. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1412-1420,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography
Oh, S.-Y. ; Kim, W.-H. ; Yune, H.-S. ; Kim, H.-B. ; Kim, S.-M. ; Ahn, C.-N. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1537-1543,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691