1.

Conference Proceedings
Conference Proceedings
1. 0.33-k1 ArF lithography for 100-nm DRAM
Bok, C.K. ; Kim, S.-K. ; Kim, H.-B. ; Oh, J.-S. ; Ahn, C.-N. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.810-821,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Polarity effects of polymer on the 193-nm resist performance
Choi, Y.-J. ; Kim, J.-. ; Kim, J.-Y. ; Yim, Y.-G. ; Kim, J. ; Jung, J.-C. ; Min, M.-J. ; Bok, C.K. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.781-788,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039