Yuan, D. ; Li, Z. ; Guo, S. ; Duan, X. ; Shi, X. ; Song, J.
Pub. info.:
Photonic applications in nonlinear optics, nanophotonics, and microwave photonics : 12-14 September 2005, Toronto, Canada. pp.59711K-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Mobile multimedia/image processing for military and security applications : 20 April 2006, Kissimmee, Florida, USA. pp.62500K-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Mobile multimedia/image processing for military and security applications : 20 April 2006, Kissimmee, Florida, USA. pp.62500H-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Dubois, M. ; Shi, X. ; Lawrence, B. L. ; Boden, E. ; Chan, K. P. ; Nielsen, M. ; Hesselink, L.
Pub. info.:
Optical data storage 2004 : 18-21 April 2004, Monterey, California, USA. pp.589-596, 2004. Bellingham. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.342-347, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Liu, F.H. ; Stoev, K. ; Shi, X. ; Tong, H.C. ; Gibbons, M. ; Re, M.
Pub. info.:
Magnetic Materials, Processes, and Devices VI, Applications to Storage and Microelectromechanical Systems (MEMS) : proceedings of the International Symposium. pp.34-44, 2000. Pennington, N.J.. Electrochemical Society
Shi, X. ; Socha, R. J. ; Bendik, J. ; Dusa, M. V. ; Conley, W. ; Su, B.
Pub. info.:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.777-784, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Tong, H.C. ; Qian, C. ; Miloslavsky, L. ; Shi, X. ; Liu, F. ; Huai, Y. ; Lederman, M. ; Dey, S.
Pub. info.:
Proceedings of the Fifth International Sympposium on Magnetic Materials, Processes, and Devices : applications to storage and microelectromechanical systems (MEMS). pp.141-155, 1998. Pennington, NJ. Electrochemical Society
Erben, C. ; Shi, X. ; Boden, E. ; Longley, L. K. ; Lawrence, B. ; Wu, P.
Pub. info.:
Optical Data Storage 2006 : 23-26 April 2006, Montreal, Canada. pp.62821A-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Wu, P. ; Shi, X. ; Lawrence, B. ; Ren, Z. ; Smolenski, J. ; Erben, C. ; Boden, E. ; Longley, K.
Pub. info.:
Optical Data Storage 2006 : 23-26 April 2006, Montreal, Canada. pp.62821B-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kaushik, V. ; De Gendt, S. ; Caymax, M. ; Young, E. ; Rohr, E. ; Van Elshocht, S. ; Delabie, A. ; Claes, M. ; Shi, X. ; Chen, I. ; Carter, R. ; Conard, T. ; Vandervorst, W. ; Schaekers, M. ; Heyns, M.
Pub. info.:
ULSI Process Integration : proceedings of the International Symposium. pp.391-396, 2003. Pennington, N.J.. Electrochemical Society
Kohlman, R. ; Klimov, V. ; Shi, X. ; Grigorova, M. ; Mattes, B. R. ; McBranch, D. ; Wang, H. ; Wudl, F. ; Nogues, J-L. ; Moreshead, W.
Pub. info.:
Electrical, optical, and magnetic properties of organic solid-state materials IV : symposium held December 1-5, 1997, Boston, Massachusetts, U.S.A.. pp.237-, 1998. Pittsburgh, Pa.. MRS - Materials Research Society
Thin films : stresses and mechanical properties IX : symposium held November 26-30, 2001, Boston, Massachusetts, U.S.A.. pp.231-238, 2002. Warrendale, Pa.. Materials Research Society
Bai, G. ; Jiang, W. ; Wang, G. ; Chen, L. ; Shi, X.
Pub. info.:
Functionally graded materials VIII : proceedings of the 8th International Symposium on Multifunctional and Functionally Graded Materials (FGM2004) : held in Leuven, Belgium, 11-14 July 2004. pp.551-554, 2005. Switzerland. Trans Tech Publications
Zhang, Z. ; Fedorenko, Y. ; Truong, L. ; Shi, X. ; Afanas'ev, V. ; Stesmans, A. ; Campbell, S.A.
Pub. info.:
Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium. pp.375-388, 2005. Pennington, N.J.. Electrochemical Society
EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium. pp.652-658, 2005. Pennington, NJ. Electrochemical Society
Shi, X. ; Pollock, T. M. ; Mahajan, S. ; Arunachalam, V. S.
Pub. info.:
High-Temperature ordered intermetallic alloys VII : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A.. pp.493-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Roy, S. ; Van Den Broeke, D.J. ; Chen, J.F. ; Liebchen, A. ; Chen, T. ; Hsu, S.D. ; Shi, X. ; Socha, R.J.
Pub. info.:
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA. pp.190-201, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology XI. pp.550-559, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Hsu, M. ; Chen, F. J. ; Van Den Broeke, D. ; En Tszng, S. ; Shieh, J. ; Hsu, S. ; Shi, X.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.628317-628317, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology XII. pp.672-677, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Hsu, M. ; Van Den Broeke, D. ; Laidig, T. ; Wampler, K. E. ; Hollerbach, U. ; Socha, R. ; Chen, J. F. ; Hsu, S. ; Shi, X.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.659-671, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photonic Applications in Devices and Communication Systems. pp.59701D-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Sixth International Symposium on Instrumentation and Control Technology: Sensors, Automatic Measurement, Control, and Computer Simulation. pp.635844-635844, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Flagello, D.G. ; Socha, R.J. ; Shi, X. ; Schoot, J.B. ; Baselmans, J. ; Kerkhof, M.A. ; Boeij, W. ; Engelen, A. ; Carpaij, R. ; Noordman, O. ; Moers, M.H.P. ; Mulder, M. ; Finders, J. ; Greevenbroek, H. ; Schriever, M. ; Maul, M. ; Haidner, H. ; Goeppert, M. ; Wegmann, U. ; Graeupner, P.
Pub. info.:
Optical Microlithography XVI. Part One pp.139-150, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lin, C. ; Hsu, M. ; Hsieh, F. ; Lin, S.Y. ; Hsu, S.D. ; Shi, X. ; Van Den Broeke, D.J. ; Chen, J.F. ; Tang, F.C. ; Hsieh, W.A. ; Huang, C.Y.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.804-811, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Hsu, S.D. ; Van Den Broeke, D.J. ; Shi, X. ; Hsu, M. ; Wampler, K.E. ; Chen, J.F. ; Yu, A. ; Yang, S.C. ; Hsieh, F.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.812-828, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering