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14 results

Conference Proceedings

1. RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]

Hsu, M. ; Chen, F. J. ; Van Den Broeke, D. ; En Tszng, S. ; Shieh, J. ; Hsu, S. ; Shi, X.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.628317-628317, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

2. Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]

Hsu, M. ; Van Den Broeke, D. ; Laidig, T. ; Wampler, K. E. ; Hollerbach, U. ; Socha, R. ; Chen, J. F. ; Hsu, S. ; Shi, X.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.659-671, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

3. Mesa or trench type for chromeless phase-shift lithography from photolithographic performance point of view

Shi, X. ; Chen, J.F. ; Hsu, S. ; Van Den Broeke, D.J. ; Socha, R.J. ; Chang, C.H. ; Dai, C.-M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1304-1312, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

4. Implementation of random contact hole design with CPL mask by using IML technology [5992-108]

Hsu, M. ; Van Den Broeke, D. ; Hsu, S. ; Chen, J. F. ; Shi, X. ; Corcoran, N. ; Yu, L.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.599237-599237, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

5. Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL)

Van Den Broeke, D.J. ; Laidig, T.L. ; Wampler, K.E. ; Hsu, S. ; Shi, X. ; Hsu, M. ; Burchard, P. ; Chen, J.F.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.579-591, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

6. Phase defect repair for the chromeless phase lithography (CPL) mask

Fan, S. ; Hsu, M. ; Tseng, A. ; Chen, J.F. ; Van Den Broeke, D.J. ; Lei, H. ; Hsu, S. ; Shi, X.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.221-231, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

7. Understanding the forbidden pitch phenomenon and assist feature placement

Shi, X. ; Hsu, S. ; Chen, J.F. ; Hsu, M. ; Socha, R.J. ; Dusa, M.V.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part Two pp.985-996, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

Conference Proceedings

8. Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Chen, J.F. ; Van Den Broeke, D.J. ; Hsu, M. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, S. ; Shafer, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.361-372, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

9. Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology

Hsu, S. ; Van Den Broeke, D.J. ; Shi, X. ; Chen, J.F. ; Knose, W.T. ; Corcoran, N.P. ; Vedula, S. ; MacNaughton, C.W. ; Richie, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.373-383, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

10.

Conference Proceedings

10. Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography

Hsu, M. ; Laidig, T. ; Wampler, K. E. ; Hsu, S. ; Shi, X. ; Chen, J. F. ; Van Den Broeke, D.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.382-393, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

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