1.

Conference Proceedings
Conference Proceedings
1. Multilevel imaging system realizing k1=0.3 lithography
Suzuki,A. ; Saitoh,K. ; Yoshii,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.396-407,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. IDEAL double exposure method for polylevel structures
Romeo,C. ; Canestrari,P. ; Fiorino,A. ; Hasegawa,M. ; Saitoh,K. ; Suzuki,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.240-251,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Practical applications of IDEAL exposure method
Hasegawa,M. ; Saitoh,K. ; Yoshii,M. ; Suzuki,A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.66-77,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873