1.

Conference Proceedings
Conference Proceedings
1. Current status of the SR stepper development(Invited Paper)
Mizusawa,N. ; Watanabe,Y. ; Hara,S. ; Saitoh,K. ; Maehara,H. ; Amemiya,M. ; Uzawa,S.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.230-239,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Application of SR lithography to 0.14-ｦﾌm device fabrication
Sumitani,H. ; Itoga,K. ; Shimano,H. ; Aya,S. ; Yabe,H. ; Hifumi,T. ; Watanabe,H. ; Kise,K. ; Inoue,M. ; Marumoto,K. ; Nishioka,Y. ; Abe,H. ; Mizusawa,N. ; Saitoh,K. ; Uzawa,S.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.222-236,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723